ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,775, issued on Aug. 11, was assigned to FUJIFILM Corp. (Tokyo). "Projection lens and projection device" was invented by Hironobu Kayano (Sa... Read More
ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,776, issued on Aug. 11, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo). "Substrate for mask blanks and method for manufacturing the sa... Read More
ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,777, issued on Aug. 11, was assigned to Kioxia Corp. (Tokyo). "Method of generating drop recipe, imprinting method, and method of manufactu... Read More
ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,778, issued on Aug. 11, was assigned to DUPONT ELECTRONIC MATERIALS INTERNATIONAL LLC (Marlborough, Mass.). "Resist underlayer compositions... Read More
ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,779, issued on Aug. 11, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate treatment method, storage medium, and substrate treatment a... Read More
ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,780, issued on Aug. 11, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo). "Resist material and patterning process" was invented by Jun H... Read More
ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,781, issued on Aug. 11, was assigned to Sumitomo Chemical Co. Ltd. (Tokyo). "Salt, acid generator, resist composition and method for produc... Read More
ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,782, issued on Aug. 11, was assigned to FUJIFILM Corp. (Tokyo). "Actinic ray-sensitive or radiation-sensitive resin composition, actinic ra... Read More
ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,783, issued on Aug. 11, was assigned to DUK SAN NEOLUX Co. LTD. (Cheonan-si, South Korea). "Method for preparing pixel define layer" was in... Read More
ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,784, issued on Aug. 11, was assigned to Hyun Min Kim (Cheonan-si, South Korea). "Substrate processing apparatus and substrate processing me... Read More