US Patent Issued to Tokyo Electron on Aug. 11 for "Substrate treatment method, storage medium, and substrate treatment apparatus" (Japanese Inventor)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,779, issued on Aug. 11, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate treatment method, storage medium, and substrate treatment apparatus" was invented by Takashi Yamauchi (Koshi City, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate treatment method performs a treatment for forming a pattern of a metal-containing resist on a substrate. The method includes changing an acid concentration in a substrate existence space where the substrate exists in a substrate treatment apparatus before a developing treatment of a film of the metal-containing resist."

The patent was filed on March 15, 2023, under Application No. 18/184,141....