US Patent Issued to Hyun Min Kim on Aug. 11 for "Substrate processing apparatus and substrate processing method" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,784, issued on Aug. 11, was assigned to Hyun Min Kim (Cheonan-si, South Korea).

"Substrate processing apparatus and substrate processing method" was invented by Hyun Min Kim (Cheonan-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Proposed is a substrate processing apparatus and a substrate processing method. The substrate processing apparatus includes a process chamber configured to have a processing space therein, a support unit configured to support a substrate within the processing space, a gas supply unit configured to supply a processing gas to the processing space, and an exhaust unit configured to exhaust the processing space,...