US Patent Issued to SHIN-ETSU CHEMICAL on Aug. 11 for "Substrate for mask blanks and method for manufacturing the same" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,776, issued on Aug. 11, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Substrate for mask blanks and method for manufacturing the same" was invented by Tomoaki Sugiyama (Joetsu, Japan), Daijitsu Harada (Joetsu, Japan), Harunobu Matsui (Joetsu, Japan), Naoki Yarita (Joetsu, Japan) and Masaki Takeuchi (Joetsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate for mask blanks having first and second main surfaces of 152 mmx152 mm square and a thickness of 6.35 mm, wherein: when a range of 132 mmx132 mm square centered on an intersection of diagonal lines is defined as a calculation region in each of the first and second main surfa...