US Patent Issued to Kokusai Electric on May 5 for "Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium" (Japanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,149, issued on May 5, was assigned to Kokusai Electric Corp. (Tokyo). "Cleaning method, method of manufacturing semiconductor device, substra... Read More

US Patent Issued to SAFRAN CERAMICS on May 5 for "Device for chemical vapour deposition" (French Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,150, issued on May 5, was assigned to SAFRAN CERAMICS (Le Haillan, France). "Device for chemical vapour deposition" was invented by Arnaud De... Read More

US Patent Issued to Tokyo Electron on May 5 for "Substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,151, issued on May 5, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate processing apparatus" was invented by Kuniyasu Sakashita (Oshu,... Read More

US Patent Issued to IMEC VZW, Katholieke Universiteit Leuven on May 5 for "Method of depositing a transition metal dichalcogenide" (Belgian Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,152, issued on May 5, was assigned to IMEC VZW (Leuven, Belgium) and Katholieke Universiteit Leuven (Leuven, Belgium). "Method of depositing ... Read More

US Patent Issued to Applied Materials on May 5 for "Multiple-metal-containing metal-oxo photoresist films by CVD and ALD methods" (California Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,153, issued on May 5, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Multiple-metal-containing metal-oxo photoresist films by... Read More

US Patent Issued to Tokyo Electron on May 5 for "Selective non-plasma deposition of mask protection material" (New York Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,154, issued on May 5, was assigned to Tokyo Electron Ltd. (Tokyo). "Selective non-plasma deposition of mask protection material" was invented... Read More

US Patent Issued to Tokyo Electron on May 5 for "Atomic layer deposition of silicon nitride film using helium gas plasma" (Japanese Inventor)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,156, issued on May 5, was assigned to Tokyo Electron Ltd. (Tokyo). "Atomic layer deposition of silicon nitride film using helium gas plasma" ... Read More

US Patent Issued to Kioxia on May 5 for "Film forming apparatus, and method of manufacturing semiconductor device" (Japanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,157, issued on May 5, was assigned to Kioxia Corp. (Tokyo). "Film forming apparatus, and method of manufacturing semiconductor device" was in... Read More

US Patent Issued to FUJI ELECTRIC on May 5 for "Semiconductor device manufacturing method" (Japanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,158, issued on May 5, was assigned to FUJI ELECTRIC Co. LTD. (Kanagawa, Japan). "Semiconductor device manufacturing method" was invented by Y... Read More

US Patent Issued to NIPPON PAINT SURF CHEMICALS on May 5 for "Chemical conversion coating agent, surface-treated metal and surface treatment method" (Japanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,159, issued on May 5, was assigned to NIPPON PAINT SURF CHEMICALS Co. LTD. (Tokyo). "Chemical conversion coating agent, surface-treated metal... Read More

• ««
• «
• 165759
• 165760
• 165761
• 165762
• 165763
• 165764
• 165765
• 165766
• 165767
• 165768
• »
• »»