ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,150, issued on May 5, was assigned to SAFRAN CERAMICS (Le Haillan, France).
"Device for chemical vapour deposition" was invented by Arnaud Delehouze (Moissy-Cramayel, France), Remi Pierre Robert Bouvier (Moissy-Cramayel, France) and Manon Fernandez (Moissy-Cramayel, France).
According to the abstract* released by the U.S. Patent & Trademark Office: "A device for fluidised bed chemical vapour deposition, includes a reactor including a treatment zone in which the fluidised bed chemical vapour deposition is intended to be carried out using at least a first and a second reactive gas and a diffuser under the treatment zone delimiting the reactor, and a heating system configured to heat ...