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US Patent Issued to Lunar Resources on June 23 for "Method and system for vacuum vapor deposition of functional materials in space" (Texas Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,662,727, issued on June 23, was assigned to Lunar Resources Inc. (Houston). "Method and system for vacuum vapor deposition of functional materi... Read More


US Patent Issued to SAMSUNG DISPLAY on June 23 for "Mask assembly and deposition apparatus including the same" (South Korean Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,662,728, issued on June 23, was assigned to SAMSUNG DISPLAY Co. LTD. (Gyeonggi-Do, South Korea). "Mask assembly and deposition apparatus includ... Read More


US Patent Issued to RIKEN TECHNOS on June 23 for "Composite film manufacturing method and organic/inorganic hybrid film manufacturing method" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,662,729, issued on June 23, was assigned to RIKEN TECHNOS Corp. (Tokyo). "Composite film manufacturing method and organic/inorganic hybrid film... Read More


US Patent Issued to Materion Advanced Materials Germany on June 23 for "CoZrTa(X) sputtering target with improved magnetic properties" (German Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,662,730, issued on June 23, was assigned to Materion Advanced Materials Germany GmbH (Alzenau, Germany). "CoZrTa(X) sputtering target with impr... Read More


US Patent Issued to Virginia Commonwealth University on June 23 for "Sputtering machines, substrate holders, and sputtering processes with magnetic biasing" (Virginia Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,662,731, issued on June 23, was assigned to Virginia Commonwealth University (Richmond, Va.). "Sputtering machines, substrate holders, and sput... Read More


US Patent Issued to ARRAYED MATERIALS (CHINA) on June 23 for "Magnetron sputtering apparatus and control method for timely detecting target shorting by monitoring electrical resistance between PVD target cathode and electrical ground in real time" (Chinese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,662,732, issued on June 23, was assigned to ARRAYED MATERIALS (CHINA) Co. LTD. (Shenzhen, China). "Magnetron sputtering apparatus and control m... Read More


US Patent Issued to Meta Platforms Technologies on June 23 for "Rotary mount in a coating apparatus" (California Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,662,733, issued on June 23, was assigned to Meta Platforms Technologies LLC (Menlo Park, Calif.). "Rotary mount in a coating apparatus" was inv... Read More


US Patent Issued to Tokyo Electron on June 23 for "Substrate processing method and substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,662,734, issued on June 23, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate processing method and substrate processing apparatus" was i... Read More


US Patent Issued to AGC GLASS EUROPE on June 23 for "Silicon oxide coated polymer films and low pressure PECVD methods for producing the same" (Belgian Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,662,735, issued on June 23, was assigned to AGC GLASS EUROPE (Louvain-la-neuve, Belgium). "Silicon oxide coated polymer films and low pressure ... Read More


US Patent Issued to KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY on June 23 for "Manufacturing method for graphene film" (South Korean Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,662,736, issued on June 23, was assigned to KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (Seoul, South Korea). "Manufacturing method for graphene ... Read More