US Patent Issued to Materion Advanced Materials Germany on June 23 for "CoZrTa(X) sputtering target with improved magnetic properties" (German Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,662,730, issued on June 23, was assigned to Materion Advanced Materials Germany GmbH (Alzenau, Germany).

"CoZrTa(X) sputtering target with improved magnetic properties" was invented by Uwe Konietzka (Geiselbach, Germany) and Martin Schlott (Offenbach, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a sputtering target consisting of an alloy consisting of Co, Zr, Ta and, optionally, one or more further element(s) X from the group of Mo, Pd, Ni, Ti, V, W, and B, characterized in that the target has a maximum magnetic permeability micro metreax of 60 or lower and/or characterized in that the target has a maximum pass...