Exclusive

Publication

Byline

Location

US Patent Issued to Adeia Semiconductor Solutions on July 21 for "Method of forming nanosheet field effect transistors with partial inside spacers" (New York, Vermont Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,251, issued on July 21, was assigned to Adeia Semiconductor Solutions LLC (San Jose, Calif.). "Method of forming nanosheet field effect tra... Read More


US Patent Issued to NXP USA on July 21 for "Transistor gate structure with insulating layer and method of fabrication therefor" (Arizona Inventor)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,252, issued on July 21, was assigned to NXP USA INC. (Austin, Texas). "Transistor gate structure with insulating layer and method of fabric... Read More


US Patent Issued to STMICROELECTRONICS (ROUSSET) on July 21 for "Electronic device comprising transistors" (French Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,253, issued on July 21, was assigned to STMICROELECTRONICS (ROUSSET) SAS (Rousset, France). "Electronic device comprising transistors" was ... Read More


US Patent Issued to MACOM TECHNOLOGY SOLUTIONS HOLDINGS on July 21 for "Metal pillar connection topologies for heterogeneous packaging" (North Carolina, California Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,254, issued on July 21, was assigned to MACOM TECHNOLOGY SOLUTIONS HOLDINGS INC. (Lowell, Mass.). "Metal pillar connection topologies for h... Read More


US Patent Issued to SAMSUNG ELECTRONICS on July 21 for "Semiconductor device sidewall of the gate semiconductor layer including a plurality of surfaces having different slopes" (South Korean Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,255, issued on July 21, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea). "Semiconductor device sidewall of the gate... Read More


US Patent Issued to NANYA TECHNOLOGY on July 21 for "Semiconductor device with capping layer and method for fabricating the same" (Taiwanese Inventor)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,256, issued on July 21, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan). "Semiconductor device with capping layer and meth... Read More


US Patent Issued to Intel on July 21 for "Stacked source or drain contact flyover" (Oregon Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,257, issued on July 21, was assigned to Intel Corp. (Santa Clara, Calif.). "Stacked source or drain contact flyover" was invented by Sukru ... Read More


US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on July 21 for "Dipole patterning for CMOS devices" (Taiwanese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,258, issued on July 21, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING Co. LTD. (Hsinchu, Taiwan). "Dipole patterning for CMOS devices"... Read More


US Patent Issued to Tokyo Electron on July 21 for "Device and method of forming 3D U-shaped nanosheet cfet" (Florida, Texas Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,259, issued on July 21, was assigned to Tokyo Electron Ltd. (Tokyo). "Device and method of forming 3D U-shaped nanosheet cfet" was invented... Read More


US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on July 21 for "Leakage reduction methods and structures thereof" (Taiwanese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,260, issued on July 21, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING Co. LTD. (Hsinchu, Taiwan). "Leakage reduction methods and struc... Read More