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US Patent Issued to The Regents of the University of California on Oct. 6 for "System and method for fully integrated microcrystal electron diffraction (MicroED)" (California Inventor)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,925, issued on Oct. 6, was assigned to The Regents of the University of California (Oakland, Calif.). "System and method for fully integrate... Read More


US Patent Issued to Hitachi High-Tech on Oct. 6 for "Sample image observation device and method" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,926, issued on Oct. 6, was assigned to Hitachi High-Tech Corp. (Tokyo). "Sample image observation device and method" was invented by Yuta Im... Read More


US Patent Issued to FEI on Oct. 6 for "Pixel elements, particle beam microscopes including the same, and associated methods" (Dutch Inventor)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,927, issued on Oct. 6, was assigned to FEI Co. (Hillsboro, Ore.). "Pixel elements, particle beam microscopes including the same, and associa... Read More


US Patent Issued to ASML Netherlands on Oct. 6 for "Operation methods of 2D pixelated detector for an apparatus with plural charged-particle beams and mapping surface potentials" (California Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,928, issued on Oct. 6, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands). "Operation methods of 2D pixelated detector for an ap... Read More


US Patent Issued to ASML Netherlands on Oct. 6 for "Assessment system, method of assessing" (Dutch Inventor)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,929, issued on Oct. 6, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands). "Assessment system, method of assessing" was invented... Read More


US Patent Issued to NuFlare Technology on Oct. 6 for "Charged particle beam writing apparatus, discharge detection method, and discharge detection apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,930, issued on Oct. 6, was assigned to NuFlare Technology Inc. (Yokohama, Japan). "Charged particle beam writing apparatus, discharge detect... Read More


US Patent Issued to SAMSUNG ELECTRONICS on Oct. 6 for "E-beam exposure method and mask manufacturing method comprising the same" (South Korean Inventor)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,931, issued on Oct. 6, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea). "E-beam exposure method and mask manufacturi... Read More


US Patent Issued to TRUMPF HUETTINGER SP. Z O. O. on Oct. 6 for "High power generator and method of supplying high power pulses" (Polish Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,932, issued on Oct. 6, was assigned to TRUMPF HUETTINGER SP. Z O. O. (Zielonka, Poland). "High power generator and method of supplying high ... Read More


US Patent Issued to TRUMPF HUETTINGER SP. Z O. O. on Oct. 6 for "High power generator and method of supplying high power pulses" (Polish Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,933, issued on Oct. 6, was assigned to TRUMPF HUETTINGER SP. Z O. O. (Zielonka, Poland). "High power generator and method of supplying high ... Read More


US Patent Issued to Applied Materials on Oct. 6 for "Pulsed voltage waveform with binary pulses for biasing of plasma" (California Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,934, issued on Oct. 6, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Pulsed voltage waveform with binary pulses for biasing... Read More