US Patent Issued to ASML Netherlands on Oct. 6 for "Assessment system, method of assessing" (Dutch Inventor)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,929, issued on Oct. 6, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Assessment system, method of assessing" was invented by Marco Jan-Jaco Wieland (Delft, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Assessment systems and methods are disclosed. In one arrangement, charged particles are directed in sub-beams arranged in a multi-beam towards a sample. A plurality of control electrodes define a control lens array. Each control lens in the control lens array is aligned with a sub-beam path of a respective sub-beam of the multi-beam and configured to operate on the respective sub-beam. A plurality of objective electrodes...