US Patent Issued to SAMSUNG ELECTRONICS on Oct. 6 for "E-beam exposure method and mask manufacturing method comprising the same" (South Korean Inventor)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,931, issued on Oct. 6, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea).

"E-beam exposure method and mask manufacturing method comprising the same" was invented by Jungwook Shon (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An E-beam exposure method may include receiving exposure information on a pattern subject to exposure, determining on beams and off beams of an E-beam exposure apparatus, determining an exposure time in an exposure process, performing the exposure process using the E-beam exposure apparatus, measuring a current of the off beams on an aperture plate of the E-beam exposure apparatus, an...