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US Patent Issued to ASML Netherlands on Oct. 6 for "Assessment system, method of assessing" (Dutch Inventor)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,929, issued on Oct. 6, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands). "Assessment system, method of assessing" was invented... Read More


US Patent Issued to NuFlare Technology on Oct. 6 for "Charged particle beam writing apparatus, discharge detection method, and discharge detection apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,930, issued on Oct. 6, was assigned to NuFlare Technology Inc. (Yokohama, Japan). "Charged particle beam writing apparatus, discharge detect... Read More


US Patent Issued to SAMSUNG ELECTRONICS on Oct. 6 for "E-beam exposure method and mask manufacturing method comprising the same" (South Korean Inventor)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,931, issued on Oct. 6, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea). "E-beam exposure method and mask manufacturi... Read More


US Patent Issued to TRUMPF HUETTINGER SP. Z O. O. on Oct. 6 for "High power generator and method of supplying high power pulses" (Polish Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,932, issued on Oct. 6, was assigned to TRUMPF HUETTINGER SP. Z O. O. (Zielonka, Poland). "High power generator and method of supplying high ... Read More


US Patent Issued to TRUMPF HUETTINGER SP. Z O. O. on Oct. 6 for "High power generator and method of supplying high power pulses" (Polish Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,933, issued on Oct. 6, was assigned to TRUMPF HUETTINGER SP. Z O. O. (Zielonka, Poland). "High power generator and method of supplying high ... Read More


US Patent Issued to Applied Materials on Oct. 6 for "Pulsed voltage waveform with binary pulses for biasing of plasma" (California Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,934, issued on Oct. 6, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Pulsed voltage waveform with binary pulses for biasing... Read More


US Patent Issued to Lam Research on Oct. 6 for "Process control for ion energy delivery using multiple generators and phase control" (California Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,935, issued on Oct. 6, was assigned to Lam Research Corp. (Fremont, Calif.). "Process control for ion energy delivery using multiple generat... Read More


US Patent Issued to Inspiring Atoms on Oct. 6 for "System and method for delivering pulsed RF power from a single generator to multiple loads" (Singaporean Inventor)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,936, issued on Oct. 6, was assigned to Inspiring Atoms Pte Ltd (Singapore). "System and method for delivering pulsed RF power from a single ... Read More


US Patent Issued to Tokyo Electron on Oct. 6 for "Plasma processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,937, issued on Oct. 6, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma processing apparatus" was invented by Nozomu Nagashima (Miyagi, ... Read More


US Patent Issued to Tokyo Electron on Oct. 6 for "Filter circuit and plasma processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,938, issued on Oct. 6, was assigned to Tokyo Electron Ltd. (Tokyo). "Filter circuit and plasma processing apparatus" was invented by Taro Ik... Read More