India, Sept. 14 -- Samsung Electronics and ASML have announced an expansion of their long-standing strategic partnership, deepening collaboration on High NA EUV lithography and advanced semiconductor manufacturing technologies that will help drive the next generation of innovation in the AI era.

Building on years of successful cooperation, the companies will work together to accelerate the development and deployment of technologies that support the increasing performance and efficiency requirements of advanced semiconductor manufacturing.

Samsung will join the industry initiative to advance next-generation 12-inch photomask technology for future manufacturing. The semiconductor industry has relied on the 6-inch photomask format for deca...