India, Sept. 22 -- At the SPIE Photomask Technology + Extreme Ultraviolet Lithography conference, Intel Foundry and ASML highlighted continued progress in bringing high numerical aperture (High NA) extreme ultraviolet (EUV) lithography into production and advancing the technologies that will shape its future adoption.

Specifically, Intel Foundry and ASML shared the following updates:

* High NA continues to be used in high-volume manufacturing production at Intel Foundry today, with more than one million wafers processed to date across early tool certification and testing, research and development efforts, and volume production on select layers for a subset of Intel Core Ultra Series 3 processors, code-named Panther Lake. Overlay, throug...