ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,468, issued on Oct. 6, was assigned to Coretronic Corp. (Hsin-Chu, Taiwan). "Illumination system having multiple light source modules and pr... Read More
ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,469, issued on Oct. 6, was assigned to Qisda Corp. (Taoyuan City, Taiwan). "Illumination system and projection device" was invented by Kai-J... Read More
ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,470, issued on Oct. 6, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany). "Method for electron beam-induced processing of a defect o... Read More
ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,471, issued on Oct. 6, was assigned to D2S INC. (San Jose, Calif.). "Mask optimization for layer accounting for overlap with other layers" w... Read More
ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,472, issued on Oct. 6, was assigned to D2S INC. (San Jose, Calif.). "Mask optimization for layer based on comparison of components in layer ... Read More
ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,473, issued on Oct. 6, was assigned to D2S INC. (San Jose, Calif.). "Mask optimization preferentially accounting for overlap regions" was in... Read More
ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,474, issued on Oct. 6, was assigned to D2S INC. (San Jose, Calif.). "Concurrent mask optimization for multiple layers" was invented by Donal... Read More
ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,475, issued on Oct. 6, was assigned to Semes Co. Ltd. (Chungcheongnam-do, South Korea). "Apparatus for treating substrate and method for tre... Read More
ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,476, issued on Oct. 6, was assigned to HUIZHOU CHINA STAR OPTOELECTRONICS DISPLAY Co. LTD. (Huizhou, China) and SHENZHEN CHINA STAR OPTOELECT... Read More
ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,477, issued on Oct. 6, was assigned to DUK SAN NEOLUX Co. LTD. (Cheonan-si, South Korea). "Photosensitive composition for forming light bloc... Read More