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INTERNATIONAL PATENT: KOMATSU LTD., 株式会社小松製作所 FILES APPLICATION FOR "SURROUNDINGS MONITORING SYSTEM FOR WORK MACHINE, WORK MACHINE AND SURROUNDINGS MONITORING METHOD FOR WORK MACHINE"

GENEVA, Feb. 23 -- KOMATSU LTD. (1-2-20, Kaigan, Minato-ku, Tokyo1058316), 株式会社小松製作所 (東京都港区海&#2... Read More


INTERNATIONAL PATENT: AGC INC., AGC株式会社 FILES APPLICATION FOR "METHOD FOR MANUFACTURING SUBSTRATE FOR MASK BLANK, METHOD FOR MANUFACTURING SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, METHOD FOR MANUFACTURING MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE FOR MASK BLANK"

GENEVA, Feb. 23 -- AGC INC. (5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008405), AGC株式会社 (東京都千代田区&#200... Read More


INTERNATIONAL PATENT: TOMOEGAWA CORPORATION, 株式会社巴川コーポレーション FILES APPLICATION FOR "ELECTROSTATIC CHUCK, SEMICONDUCTOR MANUFACTURING DEVICE AND PLASMA TREATMENT DEVICE"

GENEVA, Feb. 23 -- TOMOEGAWA CORPORATION (2-1-3, Kyobashi, Chuo-ku, Tokyo1048335), 株式会社巴川コーポレーション (&#2... Read More


INTERNATIONAL PATENT: CITIZEN MACHINERY CO., LTD., シチズンマシナリー株式会社, NATIONAL UNIVERSITY CORPORATION TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY, 国立大学法人東京農工大学 FILES APPLICATION FOR "PROCESSING PROGRAM GENERATION DEVICE AND PROCESSING PROGRAM GENERATION METHOD"

GENEVA, Feb. 23 -- CITIZEN MACHINERY CO., LTD. (4107-6, Oaza-Miyota, Miyotamachi, Kitasaku-gun, Nagano3890206), シチズンマシナリー株式... Read More


INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社 FILES APPLICATION FOR "SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD"

GENEVA, Feb. 23 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東&#20... Read More


INTERNATIONAL PATENT: SONY SEMICONDUCTOR SOLUTIONS CORPORATION, ソニーセミコンダクタソリューションズ株式会社 FILES APPLICATION FOR "DISPLAY DEVICE AND ELECTRONIC EQUIPMENT"

GENEVA, Feb. 23 -- SONY SEMICONDUCTOR SOLUTIONS CORPORATION (4-14-1, Asahi-cho, Atsugi-shi, Kanagawa2430014), ソニーセミコンダクタソ&#... Read More


INTERNATIONAL PATENT: KURITA WATER INDUSTRIES LTD., 栗田工業株式会社 FILES APPLICATION FOR "MULTI-STAGE REVERSE OSMOSIS MEMBRANE TREATMENT SYSTEM"

GENEVA, Feb. 23 -- KURITA WATER INDUSTRIES LTD. (10-1, Nakano 4-chome, Nakano-ku, Tokyo1640001), 栗田工業株式会社 (東京都中&#373... Read More


INTERNATIONAL PATENT: MITSUBISHI HEAVY INDUSTRIES THERMAL SYSTEMS, LTD., 三菱重工サーマルシステムズ株式会社 FILES APPLICATION FOR "METHOD FOR DESIGNING EVAPORATOR"

GENEVA, Feb. 23 -- MITSUBISHI HEAVY INDUSTRIES THERMAL SYSTEMS, LTD. (2-3, Marunouchi 3-Chome, Chiyoda-ku, Tokyo1008332), 三菱重工サーマルシ&#1247... Read More


INTERNATIONAL PATENT: PANASONIC INTELLECTUAL PROPERTY CORPORATION OF AMERICA, パナソニック インテレクチュアル プロパティ コーポレーション オブ アメリカ FILES APPLICATION FOR "TERMINAL, BASE STATION AND COMMUNICATION METHOD"

GENEVA, Feb. 23 -- PANASONIC INTELLECTUAL PROPERTY CORPORATION OF AMERICA (2050 W 190th Street Suite 450, Torrance, California90504), パナソニック イ&#... Read More


INTERNATIONAL PATENT: TEIJIN FRONTIER CO., LTD., 帝人フロンティア株式会社 FILES APPLICATION FOR "MODIFIED FLAT CROSS-SECTION FIBER, FABRIC AND FIBER PRODUCT"

GENEVA, Feb. 23 -- TEIJIN FRONTIER CO., LTD. (2-4, Nakanoshima 3-chome, Kita-ku, Osaka-shi, Osaka5300005), 帝人フロンティア株式会&#310... Read More