INTERNATIONAL PATENT: AGC INC., ＡＧＣ株式会社 FILES APPLICATION FOR "METHOD FOR MANUFACTURING SUBSTRATE FOR MASK BLANK, METHOD FOR MANUFACTURING SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, METHOD FOR MANUFACTURING MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE FOR MASK BLANK"

GENEVA, Feb. 23 -- AGC INC. (5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008405), ＡＧＣ株式会社 (東京都千代田区丸の内一丁目５番１号) filed a patent application (PCT/JP2025/025765) for "METHOD FOR MANUFACTURING SUBSTRATE FOR MASK BLANK, METHOD FOR MANUFACTURING SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, METHOD FOR MANUFACTURING MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SUBSTRATE FOR MASK BLANK" on Jul 18, 2025. With publication no. WO/2026/038436, the details related to the patent application was published on Feb 19, 2026.

Notably, the pat...