ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,817, issued on Oct. 20, was assigned to Cardinal CG Co. (Eden Prairie, Minn.). "Fiber optic power for adjustable magnet assemblies" was inv... Read More
ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,818, issued on Oct. 20, was assigned to NANOVISION (NANJING) TECHNOLOGY GROUP Co. LTD. (Nanjing, China). "Connection device and correspondi... Read More
ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,819, issued on Oct. 20, was assigned to Hitachi High-Tech Corp. (Tokyo). "High-voltage insulating structure, charged particle gun, and char... Read More
ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,820, issued on Oct. 20, was assigned to HITACHI HIGH-TECH Corp. (Tokyo). "Electron gun and electron microscope" was invented by Hideo Moris... Read More
ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,821, issued on Oct. 20, was assigned to NuFlare Technology Inc. (Yokohama, Japan) and NuFlare Technology America Inc. (Sunnyvale, Calif.). ... Read More
ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,822, issued on Oct. 20, was assigned to FEI Co. "Aberration correction in charged particle spectroscopy" was invented by Alexander Henstra ... Read More
ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,823, issued on Oct. 20, was assigned to Carl Zeiss Microscopy GmbH (Jena, Germany). "Ablating material for an object in a particle beam dev... Read More
ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,824, issued on Oct. 20, was assigned to Axcelis Technologies Inc. (Beverly, Mass.). "Tuning apparatus for minimum divergence ion beam" was ... Read More
ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,825, issued on Oct. 20, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma processing apparatus" was invented by Yasuaki Taniike (Nirasak... Read More
ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,826, issued on Oct. 20, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma control method, plasma processing apparatus and plasma process... Read More