ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,824, issued on Oct. 20, was assigned to Axcelis Technologies Inc. (Beverly, Mass.).

"Tuning apparatus for minimum divergence ion beam" was invented by Shu Satoh (Byfield, Mass.) and Wilhelm Platow (Newburyport, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An ion implantation system has an ion source configured to form an ion beam. A mass analyzer mass analyzes the ion beam, a scanning element scans the ion beam in a horizontal direction and a parallelizing lens translates the fanned-out scanned beam into parallel shifting scanning ion beam. For applications needing not only a mean incident angle, but highly-aligned ion incident angles and a ...