US Patent Issued to FEI on Oct. 20 for "Aberration correction in charged particle spectroscopy" (Dutch Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,822, issued on Oct. 20, was assigned to FEI Co.

"Aberration correction in charged particle spectroscopy" was invented by Alexander Henstra (Utrecht, Netherlands) and Wouter Verhoeven (Nuenen, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for correcting aberrations in a charged particle spectrometer includes receiving, by the charged particle spectrometer, a charged particle beam along an axis and applying a first decapole field to the charged particle beam by a first optical correction element of the charged particle spectrometer. At least a portion of the first optical correction element is positioned before a line focus of th...