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US Patent Issued to SEIKO EPSON on Sept. 1 for "Wavelength conversion device, light source device, and projector" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,337, issued on Sept. 1, was assigned to SEIKO EPSON Corp. (Tokyo). "Wavelength conversion device, light source device, and projector" was i... और पढ़ें


US Patent Issued to Qisda on Sept. 1 for "Projection apparatus and projecting method" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,338, issued on Sept. 1, was assigned to Qisda Corp. (Taoyuan City, Taiwan). "Projection apparatus and projecting method" was invented by Te... और पढ़ें


US Patent Issued to CANON on Sept. 1 for "Attachment optical system and image pickup apparatus" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,339, issued on Sept. 1, was assigned to CANON K.K. (Tokyo). "Attachment optical system and image pickup apparatus" was invented by Takashi ... और पढ़ें


US Patent Issued to TOPCON on Sept. 1 for "Wide-angle camera device and survey system" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,340, issued on Sept. 1, was assigned to TOPCON Corp. (Itabashi-ku, Japan). "Wide-angle camera device and survey system" was invented by Tai... और पढ़ें


US Patent Issued to LuminaMask on Sept. 1 for "Photomask for extreme ultraviolet" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,341, issued on Sept. 1, was assigned to LuminaMask Co. Ltd. (Cheonan-si, South Korea). "Photomask for extreme ultraviolet" was invented by ... और पढ़ें


US Patent Issued to Samsung SDI on Sept. 1 for "Semiconductor photoresist compositions and methods of forming patterns using the composition" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,342, issued on Sept. 1, was assigned to Samsung SDI Co. Ltd. (Yongin-si, South Korea). "Semiconductor photoresist compositions and methods ... और पढ़ें


US Patent Issued to Sumitomo Chemical on Sept. 1 for "Salt, quencher, resist composition and method for producing resist pattern" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,343, issued on Sept. 1, was assigned to Sumitomo Chemical Co. Ltd. (Tokyo). "Salt, quencher, resist composition and method for producing re... और पढ़ें


US Patent Issued to FUJIFILM on Sept. 1 for "Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,344, issued on Sept. 1, was assigned to FUJIFILM Corp. (Tokyo). "Actinic ray-sensitive or radiation-sensitive resin composition, resist fil... और पढ़ें


US Patent Issued to TORAY INDUSTRIES on Sept. 1 for "Photosensitive resin composition, photosensitive sheet, cured film, method for producing cured film, electronic component, antenna element, semiconductor package, and display device" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,345, issued on Sept. 1, was assigned to TORAY INDUSTRIES Inc. (Tokyo). "Photosensitive resin composition, photosensitive sheet, cured film,... और पढ़ें


US Patent Issued to Inha University Research and Business Foundation on Sept. 1 for "Underlayer compound for photolithography, multilayered structure formed using the same, and method for manufacturing semiconductor devices using the same" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,346, issued on Sept. 1, was assigned to Inha University Research and Business Foundation (Incheon, South Korea). "Underlayer compound for p... और पढ़ें