US Patent Issued to Samsung SDI on Sept. 1 for "Semiconductor photoresist compositions and methods of forming patterns using the composition" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,342, issued on Sept. 1, was assigned to Samsung SDI Co. Ltd. (Yongin-si, South Korea).

"Semiconductor photoresist compositions and methods of forming patterns using the composition" was invented by Taegeun Seong (Suwon-si, South Korea), Sumin Jang (Suwon-si, South Korea), Seol Hee Lim (Suwon-si, South Korea), Eunmi Kang (Suwon-si, South Korea), Yaeun Seo (Suwon-si, South Korea) and Seung-Wook Shin (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor photoresist composition includes a Sn-containing organometallic compound; a compound represented by Chemical Formula 1; and a solvent. A method of forming patterns using ...