US Patent Issued to FUJIFILM on Sept. 1 for "Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,344, issued on Sept. 1, was assigned to FUJIFILM Corp. (Tokyo).

"Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device" was invented by Aina Ushiyama (Shizuoka, Japan), Akira Takada (Shizuoka, Japan), Masafumi Kojima (Shizuoka, Japan), Akiyoshi Goto (Shizuoka, Japan), Michihiro Shirakawa (Shizuoka, Japan) and Keita Kato (Shizuoka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having excellent LWR performance can be f...