ALEXANDRIA, Va., May 5 -- United States Patent no. 12,620,549, issued on May 5, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands). "Dynamic determination of a sample inspection recipe of... Read More
ALEXANDRIA, Va., May 5 -- United States Patent no. 12,620,550, issued on May 5, was assigned to Imec vzw (Leuven, Belgium) and Katholieke Universiteit Leuven (Leuven, Belgium). "Method of performing ... Read More
ALEXANDRIA, Va., May 5 -- United States Patent no. 12,620,551, issued on May 5, was assigned to CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (Paris), INSTITUT NATIONAL DES SCIENCES APPLIQUEES DE ROUEN... Read More
ALEXANDRIA, Va., May 5 -- United States Patent no. 12,620,553, issued on May 5, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Remote surface wave propagation for semiconductor chambe... Read More
ALEXANDRIA, Va., May 5 -- United States Patent no. 12,620,554, issued on May 5, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma processing with phase-locked waveforms" was invented by Pingshan L... Read More
ALEXANDRIA, Va., May 5 -- United States Patent no. 12,620,555, issued on May 5, was assigned to Tokyo Electron Ltd. (Tokyo). "Systems and methods for plasma process" was invented by Charles Schlechte... Read More
ALEXANDRIA, Va., May 5 -- United States Patent no. 12,620,556, issued on May 5, was assigned to HITACHI HIGH-TECH Corp. (Tokyo). "Plasma processing apparatus" was invented by Tetsuo Kawanabe (Tokyo),... Read More
ALEXANDRIA, Va., May 5 -- United States Patent no. 12,620,557, issued on May 5, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma processing apparatus" was invented by Syouji Yamagishi (Nirasaki, ... Read More
ALEXANDRIA, Va., May 5 -- United States Patent no. 12,620,558, issued on May 5, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea). "Apparatus for processing substrate and method of proc... Read More
ALEXANDRIA, Va., May 5 -- United States Patent no. 12,620,559, issued on May 5, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). "Gas supply device and plasma processing apparatu... Read More