US Patent Issued to Imec vzw, Katholieke Universiteit Leuven on May 5 for "Method of performing metrology on a microfabrication pattern" (Belgian Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,620,550, issued on May 5, was assigned to Imec vzw (Leuven, Belgium) and Katholieke Universiteit Leuven (Leuven, Belgium).

"Method of performing metrology on a microfabrication pattern" was invented by Joren Severi (Leuven, Belgium), Gian Francesco Lorusso (Overijse, Belgium) and Danilo De Simone (Leuven, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes generating, by a SEM, sets of frames corresponding to regions of a microfabrication pattern, for each set of frames, estimating feature data representing edge positions, linewidths, or centerline positions of one or more features of each region of the pattern, and computing a prelim...