ALEXANDRIA, Va., May 5 -- United States Patent no. 12,620,559, issued on May 5, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Gas supply device and plasma processing apparatus" was invented by Sohee Kim (Suwon-si, South Korea), Kyeongtea Bang (Suwon-si, South Korea), Hakyoung Kim (Suwon-si, South Korea), Seungbin Lim (Suwon-si, South Korea), Yongwoo Kim (Suwon-si, South Korea) and Junghyun Cho (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A gas supply device includes a plurality of flow ratio controllers configured to output a plurality of processing gases supplied from a gas box according to respective predetermined flow ratios; a plurality of switching valve...