ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,513, issued on July 28, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Work-function metal in transistors ... Read More
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,514, issued on July 28, was assigned to Efficient Power Conversion Corp. (El Segundo, Calif.). "GaN device with uniform electric field" was... Read More
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,515, issued on July 28, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD (Hsinchu, Taiwan). "Source/drain contacts and method... Read More
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,516, issued on July 28, was assigned to International Business Machines Corp. (Armonk, N.Y.). "Semiconductor structure with two air gaps on... Read More
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,517, issued on July 28, was assigned to Infineon Technologies AG (Neubiberg, Germany). "Semiconductor device and method for manufacturing a... Read More
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,518, issued on July 28, was assigned to Mitsubishi Electric Corp. (Tokyo). "Semiconductor device and method of manufacturing the same" was ... Read More
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,519, issued on July 28, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). "Transistor unit including shared gate struct... Read More
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,520, issued on July 28, was assigned to Intel Corp. (Santa Clara, Calif.). "Coupled inductors with GaN switches in GaN 3D power block" was ... Read More
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,521, issued on July 28, was assigned to Intel Corp. (Santa Clara, Calif.). "Integrated circuit structures with trench contact depopulation ... Read More
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,522, issued on July 28, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "CMOS well regions with high dopant ... Read More