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INTERNATIONAL PATENT: ISHIGURO MANUFACTURING CO., LTD., 株式会社石黒製作所 FILES APPLICATION FOR "DOUBLE-WHEEL HOLLOW CASTER"

GENEVA, Jan. 6 -- ISHIGURO MANUFACTURING CO., LTD. (1-26-21, Tomioka, Koto-Ku, Tokyo1350047), 株式会社石黒製作所 (東京都江... Read More


INTERNATIONAL PATENT: SOMAR CORPORAITON, ソマール株式会社 FILES APPLICATION FOR "OPTICAL ELEMENT, METHOD FOR MANUFACTURING SAME, OPTICAL APPARATUS AND ANTIREFLECTION FILM"

GENEVA, Jan. 6 -- SOMAR CORPORAITON (11-2, Ginza 4-chome, Chuo-ku Tokyo1048109), ソマール株式会社 (東京都中央区&#375... Read More


INTERNATIONAL PATENT: TOYOBO CO., LTD., 東洋紡株式会社 FILES APPLICATION FOR "RESIN COMPOSITION, METHOD FOR PRODUCING RESIN COMPOSITION AND POLYIMIDE FILM"

GENEVA, Jan. 6 -- TOYOBO CO., LTD. (13-1, Umeda 1-chome, Kita-ku, Osaka-shi, Osaka5300001), 東洋紡株式会社 (大阪府大阪市&#... Read More


INTERNATIONAL PATENT: OKI ELECTRIC INDUSTRY CO., LTD., 沖電気工業株式会社 FILES APPLICATION FOR "SEMICONDUCTOR DEVICE"

GENEVA, Jan. 6 -- OKI ELECTRIC INDUSTRY CO., LTD. (1-7-12, Toranomon, Minato-ku, Tokyo1058460), 沖電気工業株式会社 (東京都&#2820... Read More


INTERNATIONAL PATENT: TORAY INDUSTRIES, INC., 東レ株式会社 FILES APPLICATION FOR "REINFORCED THERMOPLASTIC ELASTOMER COMPOSITION AND MOLDED ARTICLE"

GENEVA, Jan. 6 -- TORAY INDUSTRIES, INC. (1-1, Nihonbashi-Muromachi 2-chome, Chuo-ku, Tokyo1038666), 東レ株式会社 (東京都中央区&... Read More


INTERNATIONAL PATENT: JSP CORPORATION, 株式会社ジェイエスピー FILES APPLICATION FOR "POLYPROPYLENE RESIN FOAM PARTICLES AND POLYPROPYLENE RESIN FOAM PARTICLE MOLDED BODY"

GENEVA, Jan. 6 -- JSP CORPORATION (4-2, Marunouchi 3-chome, Chiyoda-ku, Tokyo1000005), 株式会社ジェイエスピー (東京&#37117... Read More


INTERNATIONAL PATENT: SOKEN CHEMICAL & ENGINEERING CO., LTD., 綜研化学株式会社 FILES APPLICATION FOR "RESIN COMPOSITION FOR BAKING AND SHEET FOR BAKING"

GENEVA, Jan. 6 -- SOKEN CHEMICAL & ENGINEERING CO., LTD. (29-5, Takada 3-chome, Toshima-ku, Tokyo1718531), 綜研化学株式会社 (東京都&#3... Read More


INTERNATIONAL PATENT: RESONAC CORPORATION, 株式会社レゾナック FILES APPLICATION FOR "ELECTRODE ACTIVE MATERIAL LAYER, NONAQUEOUS SECONDARY BATTERY ELECTRODE AND NONAQUEOUS SECONDARY BATTERY"

GENEVA, Jan. 6 -- RESONAC CORPORATION (9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057325), 株式会社レゾナック (東京都&#282... Read More


INTERNATIONAL PATENT: KYOCERA CORPORATION, 京セラ株式会社 FILES APPLICATION FOR "SOUND PROCESSING SYSTEM, SOUND PROCESSING DEVICE, SOUND PROCESSING METHOD AND SOUND PROCESSING PROGRAM"

GENEVA, Jan. 6 -- KYOCERA CORPORATION (6, Takeda Tobadono-cho, Fushimi-ku, Kyoto-shi, Kyoto6128501), 京セラ株式会社 (京都府京都&... Read More


INTERNATIONAL PATENT: FUJI CORPORATION, 株式会社FUJI FILES APPLICATION FOR "WASTE MATERIAL PROCESSING DEVICE, SORTING DEVICE, WASTE MATERIAL PROCESSING METHOD AND SORTING METHOD"

GENEVA, Jan. 6 -- FUJI CORPORATION (19, Chausuyama, Yamamachi, Chiryu-shi, Aichi4728686), 株式会社FUJI (愛知県知立&#24... Read More