ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,045, issued on April 14, was assigned to Semiconductor Energy Laboratory Co. Ltd. (Atsugi, Japan). "Manufacturing equipment for light-emit... Read More
ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,046, issued on April 14, was assigned to RESONAC HARD DISK Corp. (Chiba, Japan). "Heating device and method of manufacturing magnetic reco... Read More
ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,047, issued on April 14, was assigned to SK SPECIALTY Co. LTD. (Yeongju-si, South Korea) and INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HAN... Read More
ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,048, issued on April 14, was assigned to Tokyo Electron Ltd. (Tokyo). "Film forming method and film forming apparatus" was invented by Yos... Read More
ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,049, issued on April 14, was assigned to Oerlikon Surface Solutions AG, Pfaffikon (Pfaffikon, Switzerland). "Ag- and/or Cu-containing hard... Read More
ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,050, issued on April 14, was assigned to ENTEGRIS INC. (Billerica, Mass.). "Surface modified substrates and related methods" was invented ... Read More
ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,051, issued on April 14, was assigned to Lam Research Corp. (Fremont, Calif.). "Oxidation resistant protective layer in chamber conditioni... Read More
ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,052, issued on April 14, was assigned to Kokusai Electric Corp. (Tokyo). "Substrate processing apparatus, substrate processing method, met... Read More
ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,053, issued on April 14, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.). "Dog bone exhaust slit tunnel for processing chambe... Read More
ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,054, issued on April 14, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo). "Method for producing a gallium oxide semiconductor film and... Read More