ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,702, issued on July 28, was assigned to FUJIFILM Corp. (Tokyo). "Composition for treating semiconductor and method for treating object to b... Read More
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,703, issued on July 28, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Bow mitigation in high aspect ratio oxide and nitrid... Read More
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,704, issued on July 28, was assigned to NXP USA Inc. (Austin, Texas). "Type of bumpless and wireless semiconductor device" was invented by ... Read More
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,705, issued on July 28, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). "Method of wafer dicing and manufacturing met... Read More
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,706, issued on July 28, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING Co. LTD. (Hsinchu, Taiwan). "Semiconductor fabricating system ha... Read More
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,707, issued on July 28, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.). "Batch processing apparatus, systems, and related met... Read More
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,708, issued on July 28, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Apparatus for processing substr... Read More
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,709, issued on July 28, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate processing method, substrate processing apparatus, and comp... Read More
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,711, issued on July 28, was assigned to SEMES Co. LTD. (Chungcheongnam-do, South Korea). "Substrate treating apparatus and substrate treati... Read More
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,712, issued on July 28, was assigned to Kioxia Corp. (Tokyo). "Substrate processing apparatus and substrate processing method" was invented... Read More