India, Sept. 17 -- Japanese technology company Fujifilm plans to invest around Rs 800 crore (approximately USD 83 million) to establish a greenfield semiconductor materials manufacturing facility in India, adding domestic capacity in materials required for chip fabrication and strengthening the upstream segment of the country's semiconductor manufacturing ecosystem.

The investment is planned in two phases from October 2026, with commercial production targeted for FY2028, according to the company. The facility will initially focus on materials supporting front-end semiconductor processes, before expanding into surface conditioning materials and high-purity chemicals.

Fujifilm Moves from Exploration to Manufacturing The investment follows...