US Patent Issued to YAYATECH on April 21 for "Rinsing device for rinsing blue film at bottom of wafer" (Taiwanese Inventor)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,605,745, issued on April 21, was assigned to YAYATECH Co. LTD. (Hsinchu City, Taiwan).

"Rinsing device for rinsing blue film at bottom of wafer" was invented by En-Ning Lin (Hsinchu City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A rinsing device for rinsing a blue film at the bottom of a wafer, including: a base; a water tank; at least one drum disposed in the water tank and partially exposed and vertically protruded from the water tank; at least one drum driver; two vertically-movable scraper sets disposed at the base, flanking the water tank, and each having a scraper, a water collection chamber and a vertically-movable driver, with the ...