ALEXANDRIA, Va., July 7 -- United States Patent no. 12,674,350, issued on July 7, was assigned to Xin-Yi Li (Kaiping City, China).
"Gate structure" was invented by Xin-Yi Li (Kaiping City, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "An improved gate structure includes at least two spaced-apart frame bodies, gate panels, a storing portion defining a storage space, and at least one driving portion. At an entrance and exit of a building is disposed the storing portion adjacent to the frame bodies. The driving portion includes a driving assembly, at least two conveyor units installed in the storage space and in the frame bodies, and at least two clamping assemblies each disposed on one side of each conv...