ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,043, issued on April 14, was assigned to Wuhan Tianma Micro-Electronics Co. Ltd. (Wuhan, China) and Wuhan Tianma Micro-Electronics Co. Ltd. Shanghai Branch (Shanghai).
"Mask device and evaporation device" was invented by Naichao Mu (Wuhan, China), Yuan Li (Wuhan, China), Yu Xin (Wuhan, China), Jun Ma (Wuhan, China) and Lijing Han (Wuhan, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "A mask module includes a framework and a first strip plate fixed on the framework and extending along a first direction. The first strip plate is provided with a first concave-convex structure on one side edge along the first direction. At least one convex struct...