US Patent Issued to WONIK IPS on May 12 for "Substrate processing apparatus" (South Korean Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,628,605, issued on May 12, was assigned to WONIK IPS Co. LTD. (Pyeongtaek-si, South Korea).

"Substrate processing apparatus" was invented by Seung Seob Lee (Seoul, South Korea), Jeong Lim Son (Sejong-si, South Korea), Joo Ho Kim (Seoul, South Korea), Kyung Park (Seoul, South Korea), Joo Suop Kim (Hwaseong-si, South Korea), Young Jun Kim (Pyeongtaek-si, South Korea) and Byung Jo Kim (Pyeongtaek-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a substrate processing apparatus, and more particularly, the substrate processing apparatus includes a gas utility exhausting each of the reaction space and the protecti...