ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,672, issued on June 16, was assigned to VisEra Technologies Co. Ltd. (Hsin-Chu City, Taiwan).
"Exposure mask" was invented by Yueh-Ching Cheng (Hsinchu City, Taiwan), Linya Tseng (Zhubei City, Taiwan) and Jyun-You Lu (Tianzhong Township, Changhua County, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An exposure mask is provided. The exposure mask includes a plurality of pattern blocks for defining a plurality of pattern profiles. Each pattern block includes a plurality of pattern units having mask patterns, and the mask patterns are formed in an asymmetric arrangement. The exposure mask may be a binary exposure mask for forming pattern profi...