US Patent Issued to Versum Materials US on July 21 for "Composition and methods using same for carbon doped silicon containing films" (South Korean, American, Taiwanese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,400, issued on July 21, was assigned to Versum Materials US LLC (Tempe, Ariz.).

"Composition and methods using same for carbon doped silicon containing films" was invented by Haripin Chandra (San Marcos, Calif.), Xinjian Lei (Vista, Calif.), Anupama Mallikarjunan (Taipei, Taiwan) and Moo-Sung Kim (Sungnam-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A composition and method for using the composition in the fabrication of an electronic device are disclosed. Compounds, compositions and methods for depositing a low dielectric constant (greater than4.0) and high oxygen ash resistance silicon-containing film such as, without limitation,...