ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,698,559, issued on Aug. 4, was assigned to Versum Materials US LLC (Tempe, Ariz.).
"Method for depositing a film" was invented by Haripin Chandra (San Marcos, Calif.), Xinjian Lei (Vista, Calif.), Daniel P. Spence (Carlsbad, Calif.), Manchao Xiao (San Diego), Ronald Martin Pearlstein (San Marcos, Calif.), Matthew R. Macdonald (Mission Viejo, Calif.) and Madhukar B. Rao (Carlsbad, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "An atomic layer deposition method for depositing a film into surface features of a substrate is disclosed. The method may include the step of placing the substrate having surface features into a reactor. An organic passivatio...