US Patent Issued to VAT Holding on Oct. 27 for "Gas inlet valve for vacuum process chambers" (Swiss, Austrian Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,774,762, issued on Oct. 27, was assigned to VAT Holding AG (Haag, Switzerland).

"Gas inlet valve for vacuum process chambers" was invented by Florian Ehrne (Frumsen, Switzerland), Martin Netzer (Bludenz, Austria) and Hanspeter Frehner (Sevelen, Switzerland).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention relates to a gas inlet valve for the controlled inlet of a process gas into a vacuum process chamber, wherein the gas inlet valve comprises: a gas flow unit with a gas inlet, a gas outlet and an inner volume which has free access to the gas inlet and to the gas outlet, wherein the gas flow unit has a sealing surface in the inner volume, an a...