ALEXANDRIA, Va., July 14 -- United States Patent no. 12,678,745, issued on July 14, was assigned to VAT Holding AG (Haag, Switzerland).
"Device for homogenizing a gas distribution in a process chamber" was invented by Samir Jokar (Buchs, Switzerland), Sven Rieschl (Malans, Switzerland) and Daniel Dunser (San Francisco).
According to the abstract* released by the U.S. Patent & Trademark Office: "A device (1) for homogenizing a gas distribution in a process chamber (2). The device (1) has a aperture shield (3) and a linear drive (4) for moving the aperture shield (3) in a reciprocating manner in two mutually opposite linear movement directions (5) between two terminal positions. The aperture shield (3) is able to be heated by at least one h...