US Patent Issued to V TECHNOLOGY on Feb. 17 for "Differential pumping apparatus and focused charged particle beam system" (Japanese Inventors)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,555,739, issued on Feb. 17, was assigned to V TECHNOLOGY Co. LTD. (Kanagawa, Japan).

"Differential pumping apparatus and focused charged particle beam system" was invented by Michinobu Mizumura (Yokohama, Japan), Toshinari Arai (Yokohama, Japan), Takanori Matsumoto (Yokohama, Japan) and Takuro Takeshita (Yokohama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A differential pumping apparatus for creating a high vacuum inside a processing space includes a displacement drive unit configured to move a substrate to be processed or a head, to adjust parallelism and distance between a surface to be processed and a surface of the head. Gap measurement d...