ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,943, issued on April 21, was assigned to Ushio Denki K.K. (Tokyo).
"Exposure apparatus" was invented by Naoya Sohara (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "An exposure apparatus includes: a light-emission unit that emits exposure light; a mask stage that holds an exposure mask; a workpiece stage that holds a workpiece; a projection optical system that irradiates the workpiece held by the workpiece stage with the exposure light, the exposure light being emitted from the light-emission unit and passing through the exposure mask; a holding member that holds the projection optical system and is connected to the mask stage; a relative-pos...