US Patent Issued to University of South Carolina on May 19 for "Siloxane removal off landfill gas using dielectric barrier discharge plasma" (South Carolina Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,629,634, issued on May 19, was assigned to University of South Carolina (Columbia, S.C.).

"Siloxane removal off landfill gas using dielectric barrier discharge plasma" was invented by Shamia Hoque (Irmo, S.C.), Tanvir Farouk (Irmo, S.C.) and Malik M. Tahiyat (Columbia, S.C.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A dielectric barrier discharge system, employed to reform/remove organosilicon contaminants off a carrier stream to provide a sustainable, end-of-technology way of siloxane removal that will ensure siloxane does not re-enter the carrier stream, as well as generates useful end-products."

The patent was filed on Sept. 25, 2020, under Appli...