ALEXANDRIA, Va., July 21 -- United States Patent no. 12,686,919, issued on July 21, was assigned to United Semiconductor (Xiamen) Co. Ltd. (Xiamen, China).

"Deposition machine exhaust gas pipeline and operation method thereof" was invented by Jianping Cai (Shamen City, China), Chih-Chien Huang (Tainan City, Taiwan) and Wen Yi Tan (Xiamen, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention provides a deposition machine, which comprises a chamber, a first pipeline and a second pipeline, wherein one end of the first pipeline and one end of the second pipeline are connected to the chamber, and a part of the second pipeline passes through a sidewall of the first pipeline and extends into the inter...