ALEXANDRIA, Va., March 24 -- United States Patent no. 12,588,296, issued on March 24, was assigned to UNITED MICROELECTRONICS CORP. (Hsin-Chu City, Taiwan).

"ESD guard ring structure and fabricating method of the same" was invented by Chia-Chen Sun (Kaohsiung City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An ESD guard ring structure includes numerous first fin structures, numerous second fin structures, numerous first polysilicon conductive lines, numerous second polysilicon conductive lines, numerous third polysilicon conductive lines and numerous single diffusion breaks. Each of the first fin structures includes at least one single diffusion break therein. Each of the single diffusion breaks o...