ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,721,074, issued on Aug. 25, was assigned to United Microelectronics Corp. (Hsinchu, Taiwan).
"Patterning method" was invented by Yi Lin Tsai (Tainan City, Taiwan) and Chih-Hsien Tang (Taipei City, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A patterning method including the following steps is provided. A first template including at least one first main pattern, first dummy patterns, and second main patterns is provided. The first dummy patterns are located aside the first main pattern. A density of the first main pattern is less than a density of the second main patterns. A first imprint material is provided on a first substrate. The first imp...