US Patent Issued to UCHICAGO ARGONNE on May 26 for "Selective hydration by site selective atomic layer deposition" (Illinois Inventors)

ALEXANDRIA, Va., May 26 -- United States Patent no. 12,637,767, issued on May 26, was assigned to UCHICAGO ARGONNE LLC (Chicago).

"Selective hydration by site selective atomic layer deposition" was invented by Alex B. F. Martinson (Naperville, Ill.), Lei Cheng (Naperville, Ill.), Adam S. Hock (Chicago), Jessica Catharine Jones (Aurora, Ill.), Ethan Phillip Kamphaus (Chicago), Nannan Shan (Clarendon Hills, Ill.) and Chunxin Luo (Chicago).

According to the abstract* released by the U.S. Patent & Trademark Office: "A site-selective hydration strategy that enables site-selective atomic layer deposition (ALD). ALD is utilized to target specific locations on a crystalline material for deposition."

The patent was filed on Dec. 23, 2022, under A...