US Patent Issued to TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING on April 7 for "EUV excitation light source and euv light source" (German Inventor)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,598,688, issued on April 7, was assigned to TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING GMBH (Ditzingen, Germany).

"EUV excitation light source and euv light source" was invented by Stefan Piehler (Stuttgart, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "An EUV excitation light source includes a laser source configured to emit a laser beam. The laser beam includes two partial beams having different wavelengths. The EUV excitation light source further includes a separating optical element for separating the two partial beams of the laser beam into two separated beams, and a superposition unit for superimposing the two separated beams at ...