US Patent Issued to Tower Semiconductor on Sept. 22 for "Detection of a position of a wafer within a transfer robot vacuum chamber" (Israeli Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,745,593, issued on Sept. 22, was assigned to Tower Semiconductor Ltd. (Migdal Haemek, Israel).

"Detection of a position of a wafer within a transfer robot vacuum chamber" was invented by Slava Superfine (Migdal Haemek, Israel), Yaniv Malachy (Migdal Haemek, Israel) and Dany Trabelsi (Migdal Haemek, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "A location detection system for detecting a location of a wafer within a transfer robot vacuum chamber (TRVC), the detection system may include (i) an illumination unit that is configured to direct a transmitted radiation pattern through a transparent window of the TRVC and towards one or more TRVS reflec...